Interposer and semiconductor package including the same

ABSTRACT

An interposer includes a base layer including a first surface and a second surface that are opposite to each other. An interconnect structure is disposed on the first surface. The interconnect structure includes a metal interconnect pattern and an insulating layer surrounding the metal interconnect pattern. A first lower protection layer is disposed on the second surface. A plurality of lower conductive pads is disposed on the first lower protection layer. A plurality of through electrodes penetrates the base layer and the first lower protection layer. The plurality of through electrodes electrically connects the metal interconnect pattern of the interconnect structure to the lower conductive pads. At least one of the insulating layer and the first lower protection layer has compressive stress. A thickness of the first lower protection layer is in a range of about 13% to about 30% of a thickness of the insulating layer.

CROSS-REFERENCE TO RELATED APPLICATION

This application claims priority under 35 U.S.C. § 119 to Korean PatentApplication No. 10-2020-0073248, filed on Jun. 16, 2020 in the KoreanIntellectual Property Office, the disclosure of which is incorporated byreference in its entirety herein.

1. Technical Field

The present inventive concepts relate to an interposer and asemiconductor package including the same, and more particularly, to aninterposer that controls warpage and a semiconductor package includingthe interposer.

2. Discussion of Related Art

As the size of a semiconductor wafer, such as a silicon wafer, increasesthe semiconductor wafer may be bent. For example, when an interposerhaving a relatively large size is manufactured, or when semiconductorpackage processes utilize an interposer, warpage may occur in theinterposer and/or the semiconductor package due to a difference betweencoefficients of thermal expansion (CTE) of components forming theinterposer or the semiconductor package.

SUMMARY

The present inventive concepts include an interposer having increasedreliability h controlling warpage, and a semiconductor package includingthe interposer.

According to an exemplary embodiment of the present inventive concepts,an interposer includes a base layer including a first surface and asecond surface that are opposite to each other. An interconnectstructure is disposed on the first surface of the base layer. Theinterconnect structure includes a metal interconnect pattern and aninsulating layer surrounding the metal interconnect pattern. A firstlower protection layer is disposed on the second surface of the baselayer. A plurality of lower conductive pads is disposed on the firstlower protection layer. A plurality of through electrodes penetrates thebase layer and the first lower protection layer. The plurality ofthrough electrodes is configured to electrically connect the metalinterconnect pattern of the interconnect structure to the plurality oflower conductive pads. At least one of the insulating layer and thefirst lower protection layer have compressive stress. A thickness of thefirst lower protection layer is in a range of about 13% to about 30% ofa thickness of the insulating layer.

According to an exemplary embodiment of the present inventive concepts,an interposer includes a base layer including a first surface and asecond surface that are opposite to each other. An interconnectstructure is disposed on the first surface of the base layer. Theinterconnect structure includes a metal interconnect pattern and aninsulating layer surrounding the metal interconnect pattern. A firstlower protection layer is disposed on the second surface of the baselayer. A plurality of lower conductive pads is disposed on the firstlower protection layer. A plurality of through electrodes penetrates thebase layer and the first lower protection layer. The plurality ofthrough electrodes is configured to electrically connect the metalinterconnect pattern of the interconnect structure to the plurality oflower conductive pads. A conductive dummy pattern is disposed on thefirst lower protection layer. The conductive dummy pattern is separatedfrom the plurality of lower conductive pads and the plurality of throughelectrodes.

According to an exemplary embodiment of the present inventive concepts,a semiconductor package includes a base layer including a first surfaceand a second surface that are opposite to each other. An interconnectstructure is disposed on the first surface of the base layer andincludes a metal interconnect pattern and an insulating layersurrounding the metal interconnect pattern. The insulating layer hascompressive stress. A first semiconductor device and a secondsemiconductor device are mounted on the interconnect structure and areconfigured to be electrically connected to the metal interconnectpattern. A first lower protection layer is disposed on the secondsurface of the base layer. The first lower protection layer hascompressive stress. A plurality of lower conductive pads is disposed onthe first lower protection layer. A plurality of through electrodespenetrates the base layer and the first lower protection layer. Theplurality of through electrodes is configured to electrically connectthe metal interconnect pattern of the interconnect structure to theplurality of lower conductive pads. A second lower protection layer isdisposed on the first lower protection layer and the plurality of lowerconductive pads. The second lower protection layer contacts sidesurfaces of the plurality of lower conductive pads and the first lowerprotection layer and has an opening defined in the second lowerprotection layer. A plurality of connection terminals is connected tothe plurality of lower conductive pads through the opening of the secondlower protection layer. A package substrate is connected to theplurality of connection terminals. Each of the insulating layer and thefirst lower protection layer includes an inorganic material. The secondlower protection layer includes an organic material.

BRIEF DESCRIPTION OF THE DRAWINGS

Exemplary embodiments of the present inventive concepts will be moreclearly understood from the following detailed description taken inconjunction with the accompanying drawings in which:

FIGS. 1A to 3B are cross-sectional views of a control method of warpageof an interposer, according to one or more exemplary embodiments of thepresent inventive concepts;

FIG. 4 is a graph of an example of warpage changes according totemperature changes of first to third interposers of FIGS. 1A to 3Baccording to an exemplary embodiment of the present inventive concepts;

FIG. 5 is a cross-sectional view of an interposer according to anexemplary embodiment of the present inventive concepts;

FIG. 6 is an enlarged view of a partial portion of the interposer ofFIG. 5 according to an exemplary embodiment of the present inventiveconcepts;

FIG. 7 is a plan view of an example arrangement of lower conductive padsaccording to an exemplary embodiment of the present inventive concepts;

FIG. 8 is a cross-sectional view of an interposer according to anexemplary embodiment of the present inventive concepts;

FIGS. 9 and 10 are plan views of an example arrangement of lowerconductive pads and a conductive dummy pattern, according to exemplaryembodiments of the present inventive concepts;

FIG. 11 is a cross-sectional view of a semiconductor package accordingto an exemplary embodiment of the present inventive concepts;

FIGS. 12A to 12H are cross-sectional views of a manufacturing method ofan interposer according to exemplary embodiments of the presentinventive concepts; and

FIGS. 13A and 13B are cross-sectional views of a manufacturing method ofa semiconductor package according to exempla embodiments of the presentinventive concepts.

DETAILED DESCRIPTION OF EXEMPLARY EMBODIMENTS

Hereinafter, one or more exemplary embodiments of the present inventiveconcepts will be described in detail with reference to the attacheddrawings. Like reference numerals in the drawings denote like elements,and the descriptions thereof will be omitted.

FIGS. 1A to 3B are conceptual cross-sectional views of a control methodof warpage of an interposer, according to exemplary embodiments of thepresent inventive concepts.

FIGS. 1A and 1B are conceptual cross-sectional views of warpage of afirst interposer 10 according to a temperature change. FIG. 1Aillustrates the first interposer 10 having a first temperature, and FIG.1B illustrates the first interposer 10 having a second temperature. Thesecond temperature is higher than the first temperature. For example, inan exemplary embodiment, the first temperature may be in a range ofabout 20° C. to about 25° C., and the second temperature may be in arange of about 100° C. to about 400° C. However, exemplary embodimentsof the present inventive concepts are not limited thereto.

Referring to the exemplary embodiments of FIGS. 1A and 1B, the firstinterposer 10 may include a base layer 110. In an exemplary embodiment,the base layer 110 may include at least one material selected from asemiconductor material, glass, ceramic, or plastic. In an exemplaryembodiment, the base layer 110 may include a silicon wafer includingsilicon (Si), such as crystalline silicon, polycrystalline silicon oramorphous silicon. The base layer 110 may be substantially flat (e.g.,having an upper surface extending substantially in a horizontaldirection, such as the X and/or Y directions) and may include a firstsurface 111 and a second surface 113 that are opposite to each other.For example, as shown in the exemplary embodiment of FIG. 1A, the firstsurface 111 may be an upper surface of the base layer 110 and the secondsurface 113 may be a lower surface of the base layer 110. The firstsurface 111 and the second surface 113 may be spaced apart from eachother in the Z direction which is a thickness direction of the baselayer 110.

The first interposer 10 may include an interconnect structure 120disposed on the first surface 111 of the base layer 110. For example,the interconnect structure 120 may have a back-end-of-line (BEOL)structure. The interconnect structure 120 may include an insulatinglayer 123, which is disposed on the first surface 111 of the base layer110, and a metal interconnect pattern 121 that is surrounded by theinsulating layer 123.

The first interposer 10 may include a first lower protection layer 140disposed on the second surface 113 of the base layer 110 and a pluralityof lower conductive pads 150 disposed on the first lower protectionlayer 140. The lower conductive pads 150 may be electrically connectedto the metal interconnect pattern 121 via through electrodes 130penetrating the base layer 110 and the first lower protection layer 140.

The first interposer 10 may include a second lower protection layer 160disposed on the first lower protection layer 140 and the lowerconductive pads 150. The second lower protection layer 160 may cover alower surface of the first lower protection layer 140 and partialportion of each lower conductive pad 150. For example, as shown in theexemplary embodiment of FIG. 1A, the second lower protection layer 160may cover side surfaces of the lower conductive pads 150, such aslateral end portions of the lower surface of the lower conductive pads150 and sidewalls of the lower conductive pads 150.

As illustrated in the exemplary embodiments of FIGS. 1A and 1B, atemperature change of the first interposer 10 may cause warpage of thefirst interposer 10. For example, while the first interposer 10 isheated from a first temperature to a second temperature, the firstinterposer to may be deformed and may change from a substantially planar(e.g., flat) shape to an upwardly convex shape due to a rapid thermalexpansion of the metal interconnect pattern 121 of the interconnectstructure 120.

FIGS. 2A and 2B are conceptual cross-sectional views illustratingwarpage according to a temperature change of a second interposer 20.FIG. 2A illustrates the second interposer 20 having a first temperature,and FIG. 2B illustrates the second interposer 20 having a secondtemperature. The first temperature and the second temperature in FIGS.2A and 2B may the same as the first temperature and second temperaturein FIGS. 1A and 1B.

Referring to the exemplary embodiments of FIGS. 2A and 2B, the totalvolume of the lower conductive pads 151 of the second interposer 20 isgreater than the total volume of the lower conductive pads 150 of thefirst interposer 10 shown in the exemplary embodiments of FIGS. 1A and1B.

In an exemplary embodiment, the total volume of the lower conductivepads 151 of the second interposer 20 may be similar to the total volumeof the metal interconnect pattern 121. For example, in an exemplaryembodiment, the total volume of the lower conductive pads 151 of thesecond interposer 20 may be in a range of about 70% to about 100% of thetotal volume of the metal interconnect pattern 121.

While the second interposer 20 is heated from the first temperature tothe higher second temperature, the thermal expansion of the metalinterconnect pattern 121 causes a first warpage to make the secondinterposer 20 change from a substantially planar (e.g., flat) shape toan upwardly convex shape, and the thermal expansion of the lowerconductive pads 151 may cause a second warpage to make the secondinterposer 20 change from a substantially plan (e.g., flat) shape to adownwardly convex shape. The second warpage caused by the thermalexpansion of the lower conductive pads 151 and the first warpage causedby the thermal expansion of the metal interconnect pattern 121 work inopposite directions. Therefore, the second warpage may cancel ordecrease the first warpage. For example, the angle of the upwardlyconvex shape caused by the warpage of the second interposer 20 in theexemplary embodiment of FIG. 2B may be less than the angle of theupwardly convex shape caused by the warpage of the first interposer 120in the exemplary embodiment of FIG. 1B.

FIGS. 3A and 3B are conceptual cross-sectional views illustratingwarpage according to a temperature change of a third interposer 30. FIG.3A illustrates the third interposer 30 having a first temperature, andFIG. 3B illustrates the third interposer 30 having a second temperature.The first temperature and the second temperature in FIGS. 3A and 3B maythe same as the first temperature and second temperature in FIGS. 1A and1B.

Referring to the exemplary embodiments of FIGS. 3A and 3B, the thirdinterposer 30 is different from the second interposer 20 in theexemplary embodiments of FIGS. 2A and 2B based on at least one of aninsulating layer 124 and a first lower protection layer 141 of the thirdinterposer 30 having compressive stress. For example, as shown in theexemplary embodiment of FIG. 3A, the third interposer 30 may havecompressive stress applied on both the insulating layer 124 and thefirst lower protection layer 141 so that the third interposer 30 has ashape that is downwardly convex when the first temperature is applied.

The insulating layer 124 and the first lower protection layer 141 mayeach be a material layer to which compressive stress is applied. Thus,the insulating layer 124 and the first lower protection layer 141 mayhave compressive stress. In an exemplary embodiment, the insulatinglayer 124 and the first lower protection layer 141 may have thecompressive stress applied by performing a Plasma-Enhanced ChemicalVapor Deposition (PECVD) process. In an exemplary embodiment, theinsulating layer 124 and the first lower protection layer 141 mayinclude inorganic insulating materials. For example, in an exemplaryembodiment, the insulating layer 124 and the first lower protectionlayer 141 may include silicon oxide, silicon nitride, or a combinationthereof.

The insulating layer 124 and/or the first lower protection layer 141 mayprovide the compressive stress that is opposite to the tensile stressgenerated ire the third interposer 30. The compressive stress works inair opposite direction to the tensile stress, and when the tensilestress has a positive value, the compressive stress has a negativevalue. In general, the metal interconnect pattern 121 and the lowerconductive pads 151, which include metal, have the tensile stress, andthe compressive stress provided by the insulating layer 124 and thefirst lower protection layer 141 may cancel or decrease the tensilestress generated in the metal interconnect pattern 121 and the lowerconductive pads 151.

The tensile stress provided by the metal interconnect pattern 121 andthe lower conductive pads 151 may cause a third warpage by which thethird interposer 30 is deformed to be convex upwards, and thecompressive stress provided by the insulating layer 124 and the firstlower protection layer 141 may cause a fourth warpage by which the thirdinterposer 30 is deformed to be convex downwards. The fourth warpagecaused, by the compressive stress and the third warpage caused by thetensile stress extend in opposite directions, and thus, the fourthwarpage caused by the compressive stress provided by the insulatinglayer 124 and the first lower protection layer 141 may cancel ordecrease the third warpage caused by the tensile stress provided by themetal interconnect pattern 121 and the lower conductive pads 151. Forexample, as shown in the exemplary embodiment of FIGS. 3A and 3B, thethird interposer 30 may have a shape that is downwardly convex when thefirst temperature is applied due to compressive stress provided by theinsulating layer 124 and/or the first lower protection layer 141. Whenthe third interposer 30 is heated to the second temperature the tensilestress provided by the metal interconnect pattern 121 and the lowerconductive pads 151 causes the third interposer 30 to be deformed in anupwardly convex shape. However, the tensile stress on the thirdinterposer 30 is cancelled by the compressive stress on the thirdinterposer 30 such that the third interposer 30 has a shape that issubstantially flat at the second temperature.

FIG. 4 is a graph showing warpage changes according to temperaturechanges of the first to third interposers 10 to 30 of the exemplaryembodiments of FIGS. 1A to 3B. Hereinafter, referring to FIG. 4 alongwith FIGS. 1A to 3B, the warpage changes according to the temperaturechanges of the first to third interposers 10 to 30 will be described.

In the graph of FIG. 4 , the horizontal axis indicates a temperature ofan interposer, and the vertical axis indicates a sin of warpage causedin the interposer. For convenience of explanation, when the interposeris deformed to be convex upwards (e.g., a central portion of theinterposer is deformed to be convex upwards with respect to the lateraledges of the interposer), the warpage generated in the interposer isdefined as having a positive value. When the interposer is deformed tobe convex downwards (e.g., a central portion of the interposer isdeformed to be convex downwards with respect to lateral edges of theinterposer), the warpage generated in the interposer is defined ashaving a negative value. When the interposer is planar (e.g., flat), avalue of warpage generated in the interposer is defined as being zero(0).

Referring to the exemplary embodiments of FIGS. 1A, 1B, and 4 , whilethe first interposer 10 is heated from the first temperature T1 to thesecond temperature T2, the metal interconnect pattern 121 of theinterconnect structure 120 thermally expands. Due to the thermalexpansion of the metal interconnect pattern 121, the first interposer 10may be deformed to be convex upwards. As the temperature of the firstinterposer 10 increases, the warpage of the first interposer 10 maygradually increase.

For example, as illustrated in FIG. 4 , the warpage of the firstinterposer 10 may have a negative value at the first temperature T1. Thewarpage of the first interposer 10 may gradually increase according to atemperature increase and may have a positive value at the secondtemperature T2. For example, as shown in the exemplary embodiment ofFIG. 4 , the first interposer 10 may have a positive value ofapproximately 300 at the second temperature T2.

Referring to the exemplary embodiments of FIGS. 2A, 2B, and 4 , byadjusting a ratio of the total volume of the metal interconnect pattern121 and the total volume of the lower conductive pads 151, a range ofthe warpage according to the temperature change may be adjusted. Forexample, by adjusting the total volume of the lower conductive pads 151to be close to the total volume of the metal interconnect pattern 121, arange of the warpage of the second interposer 20 according to atemperature change may be less than a range of the warpage of the firstinterposer 10 of the exemplary embodiments of FIGS. A and 1B accordingto a temperature change, as in the graph of FIG. 4 .

For example, as illustrated in FIG. 4 , the warpage of the firstinterposer 10 may be similar to the warpage of the second interposer 20at the first tempo attire T1. However, because the range of the warpageof the second interposer 20 according to a temperature increase is lessthan the range of the first interposer 10, an absolute value of thewarpage of the second interposer 20 may be less than an absolute valueof the warpage of the first interposer 10 at the second temperature T2.For example, since the second interposer 20 is less deformed than thefirst interposer 10 at the second temperature T2, the second interposer20 may be more advantageous for performing a process such as a chipmount process, in which a high temperature is applied, as compared tothe first interposer 10.

Referring to the exemplary embodiments of FIGS. 3A, 3B, and 4 , as thecompressive stress is applied to the insulating layer 124 and the firstlower protection layer 141, the warpage of the third interposer 30 maydecrease.

For example, as illustrated in FIG. 4 , as the compressive stress isapplied by the insulating layer 124 and the first lower protection layer141, an absolute value of the warpage of the third interposer 30 may begreater than an absolute value of the warpage of the second interposer20 of the exemplary embodiments of FIGS. 2A and 2B at the firsttemperature T1. For example, the third interposer 30 may be deformed tohave a shape that is downwardly convex at the first temperature T1 at agreater angle than the second interposer 20 at the first temperature T1.Therefore, the third interposer 30 may have a negative warpage of about−140 at the first temperature T1 whereas the second interposer 20 has anegative warpage of about −40 at the first temperature T1. While thesecond and third interposers 20 and 30 are heated from the firsttemperature T1 to the second temperature T2, the range of the warpage ofthe second interposer 20 is almost similar to the range of the warpageof the third interposer 30, and thus, the absolute value of the warpageof the third interposer 30 may be less than the absolute value of thewarpage of the second interposer 20 at the second temperature T2. Forexample, the third interposer 30 may have a positive warpage of about 50at the second temperature T2 whereas the second interposer has apositive warpage of about 150 at the second temperature T2. Since thethird interposer 30 is less deformed than the second interposer 20 atthe second temperature T2, the third interposer 30 may be moreadvantageous to perform a process such as a chip mount process, in whicha high temperature is applied, compared to the second interposer 20.

Recently, due to an increase in a demand for semiconductor packageswhich provide a system having a high memory bandwidth, and a demand forimprovements in the signal integrity and power integrity of aninterposer, a volume of a metal interconnect pattern of the interposerhas gradually increased. As the volume of the metal interconnect patternof the interposer increases, warpage may excessively occur in theinterposer due to the tensile stress provided as the temperatureincreases.

However, according to an exemplary embodiment of the present inventiveconcepts, the warpage of the interposer may be controlled by adjusting(i) a ratio of the total volume of the lower conductive pads 151 to thetotal volume of the metal interconnect pattern 121 and/or (ii)compressive stress and a thickness of the insulating layer 124 and thefirst lower protection layer 141. For example, in all temperaturesections that are predetermined, the ratio of the total volume of thelower conductive pads 151 to the total volume of the metal interconnectpattern 121 may be adjusted, and the compressive stress applied to theinsulating layer 124 and the first lower protection layer 141 may beadjusted so that the warpage of the interposer in the predeterminedtemperature sections may be in a preset range (e.g., between about −70μm and about +70 μm). Since the warpage of the interposer iscontrollable, the reliability of the interposer and that of asemiconductor package including the interposer may be increased.

FIG. 5 is a cross-sectional view of an interposer 100 according to anexemplary embodiment of the present inventive concepts. FIG. 6 is anenlarged view illustrating an enlarged portion of the interposer 100 ofFIG. 5 according to an exemplary embodiment of the present inventiveconcepts. FIG. 7 is a plan view of an example arrangement of lowerconductive pads 153 according to an exemplary embodiment of the presentinventive concepts. Hereinafter, for convenience of explanation, thedescriptions provided above for substantially identical elements will beomitted or simplified.

Referring to the exemplary embodiments of FIGS. 5 to 7 , the interposer100 may include the base layer 110, the interconnect structure 120, thethrough electrodes 130, a first lower protection layer 145, the lowerconductive pads 153, and the second lower protection layer 160.

The interconnect structure 120 may be disposed on the first surface 111of the base layer 110 and may include the insulating layer 125, whichcovers the first surface 111 of the base layer 110, and the metalinterconnect pattern 121, which is surrounded by the insulating layer125.

In an exemplary embodiment, the insulating layer 125 may include aninorganic insulating, material to which compressive stress is applied.In an exemplary embodiment, the insulating layer 125 may havecompressive stress alter a Plasma-Enhanced Chemical Vapor Deposition(PECVD) process. For example, the insulating layer 125 may include atleast one of oxide and nitride. For example, in an exemplary embodimentthe insulating layer 175 may include at least one of silicon oxide andsilicon nitride. To adjust the compressive stress of the insulatinglayer 125, process conditions of the PECVD process for forming theinsulating layer 125 and/or a thickness of the insulating layer 125 maybe adjusted.

In an exemplary embodiment, the compressive stress of the insulatinglayer 125 may be in a range of about 150 MPa to about 250 MPa.

In an exemplary embodiment, a thickness of the insulating layer 125 inthe Z direction which is perpendicular to the first surface 111 of thebase layer 110 may be in a range of about 8 μm to about 12 μm. Forexample, in an exemplary embodiment, the thickness of the insulatinglayer 125 at the first direction may be about 10 μm.

The metal interconnect pattern 121 may include conductive line patterns1211, which are disposed at different levels in the insulating layer 125(e.g., different distances from the first surface 111 in the Zdirection) and form a multilayered structure. The metal interconnectpattern 121 also includes conductive vias 1213 extending in a verticaldirection (e.g., extending substantially in the Z direction) in theinsulating layer 125 to electrically connect the conductive linepatterns 1211 to each other. FIG. 5 illustrates that the metalinterconnect pattern 121 includes the conductive line patterns 1211which form a four-layer structure. However, exemplary embodiments of thepresent inventive concepts are not limited thereto and the number of theconductive line patterns 1211 disposed on different levels may vary inother exemplary embodiments. For example, the metal interconnect pattern121 may include the conductive line patterns 1211 forming amulti-layered structure of two, three, or live or more layers. In anexemplary embodiment, the conductive line patterns 1211 and conductivevias 1213 may each include at least one metal selected from the groupconsisting of tungsten (W), aluminum (Al), and copper (Cu).

The first lower protection layer 145 may be disposed on and cover thesecond surface 113 of the base layer 110. The first lower protectionlayer 145 may include upper and lower surfaces that are opposite to eachother (e.g., in the Z direction). The upper surface of the first towerprotection layer 145 may directly contact a lower surface of the baselayer 110, and the lower surface of the first lower protection layer 145may directly contact an upper surface of the second lower protectionlayer 160 and upper surfaces of the lower conductive pads 153. Also, thefirst lower protection layer 145 may cover portions of the sidewalls ofthe through electrode 130 that protrude from the second surface 113 ofthe base layer 110. As shown in the exemplary embodiment of FIG. 5 , thelower surface of the first lower protection layer 145 may be disposed atthe same level as a lower surface of the through electrode 130contacting the lower conductive pad 153.

The first lower protection layer 145 may include an inorganic insulatingmaterial to which the compressive stress is applied. Therefore, thefirst lower protection layer 145 may have compressive stress. In anexemplary embodiment, the first lower protection layer 145 may have thecompressive stress applied according to the PECVD process. For example,the first lower protection layer 145 may include at least one of oxideand nitride. For example, the first lower protection layer 145 mayinclude at least one of silicon oxide and silicon nitride. In thisexemplary embodiment, to adjust the compressive stress that is appliedto the first lower protection layer 145, the process conditions of thePECVD process for forming, the first lower protection layer 145 and/orthe thickness of the first lower protection layer 145 may be adjusted.

In an exemplary embodiment, a thickness 145T of the first lowerprotection layer 145 in the first direction (e.g., the Z direction) maybe in a range of about 1.3 μm to about 3.0 μm. For example, thethickness 145T of the first lower protection layer 145 may be in a rangeof about 1.8 μm to about 2.5 μm.

In an exemplary embodiment, the compressive stress of the first lowerprotection layer 145 may be in a range of about 100 MPa to about 200MPa.

In an exemplary embodiment, the insulating layer 125 may havecompressive stress that is greater than the compressive stress of thefirst lower protection layer 145. For example, a difference between thecompressive stress of the insulating layer 125 and the compressivestress of the first lower protection layer 145 may be in a range ofabout 50 MPa to about 150 MPa. In an exemplary embodiment, the PECVDprocess for forming the insulating layer 125 may be performed at ahigher temperature than the PECVD process for forming the first lowerprotection layer 145 to enable the insulating layer 125 to have greatercompressive stress than the first lower protection layer 145. Since theinsulating layer 125, which surrounds the metal interconnect pattern 121having a relatively large volume has a relatively large compressivestress, the tensile stress of the metal interconnect pattern 121 may beeffectively cancelled by the compressive stress of the insulating layer125.

In an exemplary embodiment, the thickness 145T of the first lowerprotection layer 145 in the Z direction may be in a range of about 13%to about 30% of a thickness 125T of the insulating layer 125 in the Zdirection. For example, in an exemplary embodiment in which thethickness 125T of the insulating layer 125 in the Z direction is about10 μm, the thickness 1451 of the first lower protection layer 145 in theZ direction may be in a range of about 1.3 μm to about 3.0 μm. When thethickness 145T of the first lower protection layer 145 in the firstdirection is less than about 13% of the thickness 125T of the insulatinglayer 125 in the Z direction, the base layer 110 may not be sufficientlyprotected. When the thickness 145T of the first lower protection layer145 in the Z direction is greater than 30% greater of the thickness 125Tof the insulating layer 125 in the first direction, the warpage of theinterposer 100 may be unnecessarily increased, such as at roomtemperature.

In an exemplary embodiment, the first lower protection layer 145 mayhave a multilayered structure in which insulating layers aresequentially stacked on the second surface 113 of the base layer 110.For example, as shown in the exemplary embodiment of FIG. 6 , the firstlower protection layer 145 may include a first layer 1451 which directlycontacts the second surface 113 of the base layer 110, and a secondlayer 1452, which is disposed on the first layer 1451 and directlycontacts the second lower protection layer 160 and the lower conductivepads 153. In an exemplary embodiment, the first layer 1451 of the firstlower protection layer 145 may include silicon oxide having a relativelyhigh adhesion. In this exemplary embodiment, adhesion between the firstlower protection layer 145 and the base layer 110 may increase. Also, inan exemplary embodiment, the second layer 1452 of the first lowerprotection layer 145 may include silicon nitride that is relatively easyto apply relatively high compressive stress through the PECVD process.

The lower conductive pads 153 may be disposed on the lower surface ofthe first lower protection layer 145. For example, in an exemplaryembodiment, the lower conductive pads 153 may be connected toboard-interposer connection terminals 183. The lower conductive pads 153may be spaced apart from each other on the lower surface of the firstlower protection layer 145. For example, the lower conductive pads 153may be spaced apart from each other in a horizontal direction, such asin the X direction and/or the Y direction that are parallel to an uppersurface of the first surface 111. In an exemplary embodiment, the lowerconductive pads 153 may include, for example, at least one metalselected from the group consisting of W, Al, and Cu. In an exemplaryembodiment, a thickness of the lower conductive pad 153 may be betweenabout 3 μm and about 5 μm.

The second lower protection layer 160 may be disposed on the first lowerprotection layer 145 and the lower conductive pads 153. The second lowerprotection layer 160 may cover the lower surface of the first lowerprotection layer 145 that is exposed by the lower conductive pads 153and side surfaces of the lower conductive pads 153, such as lateral endportions of the lower surface of the lower conductive pads 153 andsidewalls of the lower conductive pads 153. The second lower protectionlayer 60 may include an opening defined therein which exposes a partialportion of the lower surface of the lower conductive pad 153. Forexample, as shown in the exemplary embodiment of FIG. 6 , the opening ofthe second lower protection layer 160 may expose a central portion ofthe lower surface of the lower conductive pad 153. The board-interposerconnection terminal 183 may be connected to the lower conductive pad 153through the opening of the second lower protection layer 160. In anexemplary embodiment, the opening of the second lower protection layer160 may be a hole formed in the second lower protection layer 160 andmay have a horizontal width (e.g., length in the X direction) that is ina range of about 25% to about 45% of a horizontal width (e.g., length inthe X direction) of the lower conductive pad 153.

In an exemplary embodiment, the second lower protection layer 160 mayinclude a material that is different from a material for forming thefirst lower protection layer 145. For example, in an exemplaryembodiment, the first lower protection layer 145 may include aninorganic insulating material, and the second lower protection layer 160may include an organic insulating material. In an exemplary embodiment,the second lower protection layer 160 may include a Photo ImageableDielectric (PID) such as polyimide. In this exemplary embodiment, thecompressive stress of the first lower protection layer 145 may cancel ordecrease the tensile stress of the second lower protection layer 160.

As shown in the exemplary embodiment of FIG. 5 , the interposer 100 mayinclude lower connection pillars 181 disposed on the lower conductivepads 153. The lower connection pillar 181 may be connected to the lowerconductive pad 153 through the opening of the second lower protectionlayer 160 and may contact a portion of the second lower protection layer160 covering lateral edges of the lower surface of the lower conductivepad 153. In an exemplary embodiment, the lower connection pillar 181 mayfunction as an Under Bump Metallurgy (UBM). For example, theboard-interposer connection terminals 183 for connecting the interposer100 to a board such as a Printed Circuit Board (PCB) may be attached onthe lower connection pillar 181. In an exemplary embodiment, the lowerconnection pillar 181 may include nickel (Ni), Cu, palladium (Pd),platinum (Pt), gold (Au), or a combination thereof. In some exemplaryembodiments, the lower connection pillar 181 may not be formed. In anexemplary embodiment, the thickness of the lower connection pillar 181may be in a range of about 2.5 μm to about 3.5 μm.

As shown in the exemplary embodiment of FIG. 5 , the upper protectionlayer 171 and the upper conductive pads 1 may be disposed on the uppersurface of the interconnect structure 120.

The upper protection layer 171 may cover the upper face of theinterconnect structure 120 and a partial portion of each upperconductive pad 173. For example, the upper protection layer 171 maycover a partial portion of an upper surface of each upper conductive pad173, such as lateral edges of the upper surface of each upper conductivepad 173, and sidewalls thereof. The upper protection layer 171 mayprotect the interconnect structure 120 and the upper conductive pads 173from external impact or moisture. The upper protection layer 171 mayinclude an opening exposing a partial portion of the tapper surface ofeach upper conductive pad 173. For example, as shown in the exemplaryembodiment of FIG. 6 , the opening of the upper protection layer 171 mayexpose a central portion of the upper surface of each upper conductivepad 173.

In an exemplary embodiment, the upper protection layer 171 may havecompressive stress. For example, the upper protection layer 171 may havecompressive stress applied thereon. The upper protection layer 171 mayinclude an insulating material to which the compressive is applied. Forexample, in an exemplary embodiment, the upper protection layer 171 mayinclude silicon oxide, silicon nitride, or a cos combination thereof.The upper protection layer 171 may have the compressive stress and mayadjust the warpage of the interposer 100 together with the insulatinglayer 125 and the first lower protection layer 145.

The interposer 100 may include upper connection pillars 175 disposed onthe upper conductive pads 173. The upper connection pillar 175 may beconnected to the upper conductive pad 173 through the opening of theupper protection layer 171 and may contact a portion of the upperprotection layer 171 covering the lateral edges of the upper surface ofthe upper conductive pad 173. In an exemplary embodiment, the upperconnection pillar 175 may be a portion to which a chip-interposerconnection terminal for connecting a semiconductor device, which ismounted on the interposer 100, to the interposer 100 is attached. In anexemplary embodiment, the upper connection pillar 175 may include Ni,Cu, Pd, Pt, Au, or a combination thereof. However, exemplary embodimentsof the present inventive concepts are not limited thereto. For example,in some exemplary embodiments the upper connection pillar 175 may not beformed.

The through electrodes 130 may electrically connect the metalinterconnect pattern 121 of the interconnect structure 120 to the lowerconductive pads 153. The through electrodes 130 may extend from thefirst surface 111 to the second surface 113 of the base layer 110 andmay vertically penetrate the base layer 110 (e.g., substantially in theZ direction). Also, the through electrodes 130 may further penetrate thefirst lower protection layer 145 disposed on the second surface 113 ofthe base layer 110. An upper portion of the through electrode 130 may beconnected to a lower surface of the metal interconnect pattern 121 ofthe interconnect structure 120, and a lower portion of the throughelectrode 130 may be connected to an upper surface of the lowerconductive pad 153.

For example, in an exemplary embodiment, the through electrode 130 mayinclude a conductive plug that penetrates the base layer 110 and thefirst lower protection layer 145 and has a pillar shape, and aconductive barrier layer having a cylindrical shape and surroundingsidewalls of the conductive plug. In an exemplary embodiment, theconductive barrier layer may include at least one material selected fromthe group consisting of Ti, TiN, Ta, TaN. Ru, Co, Mn, WN, Ni, and NiB,and the conductive plug may include at least one material selected fromthe group consisting of a Cu alloy such as Cu, CuSn, CuMg, CuNi, CuZn,CuPd, CuAu, CuRe, or CuW, W, a W alloy, Ni, Ru, and Co. A via insulatinglayer 131 may be disposed on the sidewalk of the through electrode 130and may be positioned between the base layer 110 and the throughelectrode 130 and between the first lower protection layer 145 and thethrough electrode 130. In an exemplary embodiment, the via insulatinglayer 131 may include an oxide layer, a nitride layer, a carbide layer,a polymer, or a combination thereof. In an exemplary embodiment, anaspect ratio of the through electrode 130, such as a ratio of a width ofthe through electrode 130 in a horizontal direction (e.g., the Xdirection) to a height of the through electrode 130 in a verticaldirection (e.g., the Z direction) may be in a range of about 7 to about9.

As shown in the exemplary embodiments of FIGS. 5-6 , the interposer 100may have a redundancy via structure in which one lower conductive pad153 is connected to at least two through electrodes 130. In thisexemplary embodiment, although any one of the at least two throughelectrodes 130 is defective, a defect in an electrical connection of theinterposer 100 may be prevented as other through electrodes 130 aredriven. However, exemplary embodiments of the present inventive conceptsare not limited thereto.

In an exemplary embodiment, to adjust the range of the warpage of theinterposer 100 according to the temperature change, a ratio between thetotal volume of the lower conductive pads 153 and the total volume ofthe metal interconnect pattern 121 may be adjusted. For example, thetotal volume of the lower conductive pads 153 may be set to be similarto the total volume of the metal interconnect pattern 121 to decreasethe range of the warpage of the interposer 100 according to thetemperature change. For example, the total volume of the lowerconductive pads 153 may be in a range of about 70% to about 100% of thetotal volume of the metal interconnect pattern 121. For example, thetotal volume of the lower conductive pads 153 may be in a range of about1.26 mm³ to about 1.8 mm³.

In an exemplary embodiment, the thicknesses of the lower conductive pads153 may be uniform. In an exemplary embodiment in which the lowerconductive pad 153 has an upper surface that contacts lower surfaces ofthe first lower protection layer 145 and the through electrode 130, anda lower surface opposite to the upper surface, the upper and lowersurfaces of the lower conductive pad 153 may be substantially planar(e.g., extending substantially in the X direction).

As illustrated in the exemplary embodiment of FIG. 7 , the lowerconductive pads 153 may be arranged on the first lower protection layer145 in a matrix form, and the lower conductive pads 153 may each have asquare shape in a plan view (e.g., in a plane defined in the X and Ydirections). The lower conductive pads 153 may be arranged to have apitch 195 that is predetermined. In an exemplary embodiment in which thelower conductive pads 153 have square shapes, the total volume of thelower conductive pads 153 may be increased in a limited area.

In an exemplary embodiment, a gap 193 (e.g., in the X direction or the Ydirection) between adjacent lower conductive pads 153 may be in a rangeof about 30% to about 70% of a width 191 of the lower conductive pad 153in a horizontal direction (e.g., the X direction or the direction). Inan embodiment in which the gap 193 between the adjacent lower conductivepads 153 is less than about 30% of a width 191 of the lower conductivepads 153 in the horizontal direction, the adjacent lower conductive pads153 may unintendedly contact each other. When the gap 193 between theadjacent lower conductive pads 153 is greater than about 70% of thewidth 191 of the lower conductive pads 153 in the horizontal direction,it may be difficult to adjust the total volume of the lower conductivepads 153 to be close to the total volume of the metal interconnectpattern 121. For example, when the pitch 195 of the lower conductivepads 153 is about 180 μm, the width 191 of the lower conductive pad 153in the horizontal direction may be about 120 μm, and the gap 193 betweenthe neighboring lower conductive pads 153 may be about 60 μm.

FIG. 8 is a cross-sectional view of an interposer according to anexemplary embodiment of the present inventive concepts.

The interposer of the exemplary embodiment of FIG. 8 may be similar tothe interposer 100 of the exemplary embodiments of FIGS. 5 to 7 exceptthat the interposer of FIG. 8 further includes a conductive dummypattern 159. Hereinafter, a difference between the interposer of theexemplary embodiment of FIG. 8 and the interposer 100 of the exemplaryembodiments of FIGS. 5 to 7 will be mainly described and a descriptionof substantially identical elements may be omitted for convenience ofexplanation.

Referring to the exemplary embodiment of FIG. 8 , the interposer mayinclude the conductive dummy pattern 159 disposed on the first lowerprotection layer 145. The conductive dummy pattern 159 may be separatedfrom the lower conductive pads 153 and the through electrodes 130. Forexample, as shown in the exemplary embodiment of FIG. 8 , the conductivedummy patter 159 may be spaced apart from the lower conductive pads 153and the through electrodes 130 in the X direction. The conductive dun apattern 159 may be electrically insulated from the lower conductive pads153 and the through electrodes 130. The conductive dummy pattern 159 maybe disposed between the lower conductive pads 153 arranged in a matrixform.

The second lower protection layer 160 may fill gaps between theconductive dummy pattern 159 and the lower conductive pads 153 and mayseparate the conductive dummy pattern 159 from the lower conductive pads153. For example, as shown in the exemplary embodiment of FIG. 8 , theconductive dummy pattern 159 may include an upper surface that directlycontacts the first lower protection layer 145 and a lower surfaceopposite to the upper surface (e.g., in the Z direction). The lowersurface of the conductive dummy pattern 159 and a side surface of theconductive dummy pattern 159, such as the sidewalls of the conductivedummy pattern 159, may be covered by the second lower protection layer160.

In an exemplary embodiment, the conductive dummy pattern 159 may beformed by performing the same process as the process for forming thelower conductive pads 153. In an exemplary embodiment, the conductivedummy pattern 159 may include the same material as the lower conductivepads 153 and may be disposed at the same level as the lower conductivepads 153.

To adjust the warpage of the interposer, a sum of the total volume ofthe lower conductive pads 153 and the total volume of the conductivedummy pattern 159 may be adjusted to be similar to the total volume ofthe metal interconnect pattern 121. In an exemplary embodiment, the sumof the total volume of the lower conductive pads 153 and the totalvolume of the conductive dummy pattern 159 may be in a range of about70% to about 100% of the total volume of the metal interconnect pattern121.

As the interposer is heated, the warpage of the conductive dummy pattern159, which is caused by the thermal expansion, and the warpage of themetal interconnect pattern 121, which is caused by the thermalexpansion, may extend in opposite directions. Therefore, the warpage ofthe conductive dummy pattern 159, which is caused by the thermalexpansion, and the warpage of the lower conductive pads 153, which iscaused by the thermal expansion, may cancel or decrease the warpage ofthe metal interconnect pattern 121 caused by the thermal expansion.

FIGS. 9 and 10 are plan views of an example arrangement of the lowerconductive pads 153 and the conductive dummy pattern 159, according toexemplary embodiments of the present inventive concepts.

Referring to the exemplary embodiment of FIG. 9 , the conductive dummypattern 159 may extend along the side surfaces of the lower conductivepads 153. For example, as shown in the exemplary embodiment of FIG. 9 ,the conductive dummy pattern 159 may extend along side surfaces of thelower conductive pads 153 extending in both the X and Y directions. Theconductive dummy pattern 159 may extend along the side surfaces of eachlower conductive pad 153. The conductive dummy pattern 159 may surroundeach lower conductive pad 153 in a plan view (e.g., in a plane definedin the X and directions). For example, in a plan view (e.g., in a planedefined in the X and Y directions), the conductive dummy pattern 159 mayform a cavity in which at least one lower conductive pad 153 isaccommodated in the cavity. In the exemplary embodiment of FIG. 9 , onelower conductive pad 153 is located in each cavity formed by theconductive dummy pattern 159. However, exemplary embodiments of thepresent inventive concepts are not limited thereto and two or more lowerconductive pads 153 may be located in one cavity formed by theconductive dummy pattern 159 in other exemplary embodiments.

The pitch 195 of the lower conductive pads 153 may be identical to thepitch 195 of the lower conductive pads 153 of the exemplary embodimentof FIG. 7 . However, a width 191′ of the lower conductive pads 153 maybe less than a width 191 of the lower conductive pads 153 of FIG. 7 ,and a gap 193′ between the adjacent lower conductive pads 153 may begreater than the gap 193 between the adjacent lower conductive pads 153of FIG. 7 . For example, when the pitch 195 of the lower conductive pads153 is about 180 μm, a width 191′ of the lower conductive pad 153 in thehorizontal direction may be about 100 μm, and the gap 193′ between theadjacent lower conductive pads 153 may be about 80 μm. For example, awidth 197 of the conductive dummy pattern 159 may be about 50 μm.However, exemplary embodiments of the present inventive concepts are notlimited thereto. The width 197 of the conductive dummy pattern 159 maybe appropriately adjusted to make the total volume of the conductivedummy pattern 159 have a predetermined value.

Referring to the exemplary embodiment of FIG. 10 , the conductive dummypattern 159 may include unit patterns that are spaced apart from eachother. Each unit pattern of the conductive dummy pattern 159 may bedisposed between two adjacent lower conductive pads 153. FIG. 10illustrates that one unit pattern is disposed between two adjacent lowerconductive pads 153 (e.g., in the X and Y direction). However, unlikethe exemplary embodiment of FIG. 10 , there may be gaps between adjacentunit patterns in the X and Y directions and there may not be aconductive dummy pattern 159 disposed between some pairs of the lowerconductive pads 153 that are diagonally adjacent to each other (e.g., ina direction between the X and Y directions). However, exemplaryembodiments of the present inventive concepts are not limited theretoand the gaps between the unit patterns of the conductive dummy pattern159 may be variously arranged.

FIG. 11 is a cross-sectional view of a semiconductor package 1000according to an exemplary embodiment of the present inventive concepts.

Referring to the exemplary embodiment of FIG. 11 , the semiconductorpackage 100 may include a package substrate 510, the interposer 100mounted on the package substrate 510, and first and second semiconductordevices 210 and 220 mounted on the interposer 100. The semiconductorpackage 1000 of the exemplary embodiment of FIG. 11 includes theinterposer 100 described with reference to the exemplary embodiments ofFIGS. 5 to 7 . However, exemplary embodiments of the present inventiveconcepts are not limited thereto and the semiconductor package 1000 mayinclude the interposer of the exemplary embodiments of FIGS. 8 to 10 inother exemplary embodiments.

As shown in the exemplary embodiment of FIG. 11 , the firstsemiconductor device 210 and the second semiconductor device 220 may bespaced apart from each other on the interconnect structure 120 of theinterposer 100 in the horizontal direction. The first semiconductordevice 210 and the second semiconductor device 220 may be electricallyconnected to each other through the metal interconnect pattern 121 ofthe interconnect structure 120. The first semiconductor device 210 maybe mounted on the interposer 100 through a first chip connectionterminal 231, and the second semiconductor device 220 may be mounted onthe interposer 100 through a second chip connection terminal 233attached to a pad 221 of the second semiconductor device 220A firstunderfill material layer 311 surrounding the first chip connectionterminals 231 may be disposed between the first semiconductor device 210and the interposer 100, and a second underfill material layer 313surrounding the second chip connection terminals 233 may be disposedbetween the second semiconductor device 220 and the interposer 100.

While the exemplary embodiment of FIG. 11 illustrates an example inwhich two semiconductor devices are mounted on the interposer 100,exemplary embodiments of the present inventive concepts are not limitedthereto. For example, in other exemplary embodiment, the semiconductorpackage 1000 may include three or more semiconductor devices disposed onthe interposer 100.

In an exemplary embodiment, the first semiconductor device 210 may be astacked memory device. For example, the first semiconductor device 210may include a buffer die 211 and core dies 213. For example, in anexemplary embodiment, the buffer die 211 may be referred to as aninterface die, a base die, a logic die, a master die, or the like, andeach core die 213 may be referred to as a memory die, a slave die, orthe like. FIG. 11 illustrates that the first semiconductor device 210includes two core dies 213, but the number of core dies 213 may vary inother exemplary embodiments. For example, in another exemplaryembodiment, the first semiconductor device 210 may include four, eight,twelve, or sixteen core dies 213.

The buffer die 211 and the core dies 213 may include through siliconvias (TSVs). The buffer die 211 and the core dies 213 may be stackedthrough the TSVs and may be electrically connected to each other.Accordingly, the first semiconductor device 210 may have athree-dimensional (3D) memory structure in which multiple dies arestacked. For example, the first semiconductor device 210 may be realizedaccording to High Bandwidth Memory (HEM) standards or Hybrid Memory Cube(HMC) standards.

Each core die 213 may include a memory cell array. The buffer die 211may include a physical layer and a direct access area. The physicallayer of the buffer die 211 may include interface circuits for aconnection with an external host device and may be electricallyconnected to the second semiconductor device 220 through the interposer100. The first semiconductor device 210 may receive signals from thesecond semiconductor device 220 through the physical layer or maytransmit signals to the second semiconductor device 220. The signalsand/or data received through the physical layer of the buffer die 211may be transmitted to the core dies 213 through the TSVs. The directaccess area may provide an access path via which the first semiconductordevice 210 may be tested without using the second semiconductor device220. The direct access area may include a conductive means (e.g., a portor a pin) that may directly communicate with the external test device.

An insulating adhesion layer 217 may be disposed between the buffer die211 and the core die 213 or between the core dies 213. In an exemplaryembodiment, the insulating adhesion layer 217 may include, for example,a Non Conductive Film (NCF), a Non Conductive Paste (NCP), an insulatingpolymer, or epoxy resin. The first semiconductor device 210 may includea molding layer 215 that covers a side surface of the buffer die 211 andside surfaces of the core dies 213. For example, as shown in theexemplary embodiment of FIG. 11 , the molding layer 215 may coverlateral ends of the upper surface of the buffer die 211 and sidewalk ofthe core dies 213. In an exemplary embodiment, the molding layer 215 mayinclude, for example, epoxy mold compound (EMC).

In an exemplary embodiment, the second semiconductor device 220 may be,for example, a system-on-chip, a central processing unit (CPU) chip, agraphics processing unit (GPU) chip, or an application processor (AP)chip.

The second semiconductor device 220 may execute applications supportedby the semiconductor package 1000 by using the first semiconductordevice 210. For example, in an exemplary embodiment, the secondsemiconductor device 220 may execute specialized arithmetic operationsby including at least one of a CPU, an AP, a GPU, a Neural ProcessingUnit (NPU), a Tensor Processing Unit (TPU), a Vision Processing Unit(VPU), an image Signal Processor (ISP), and a Digital Signal Processor(DSP).

The second semiconductor device 220 may include a physical layer and amemory controller. The physical layer of the second semiconductor device220 may include input/output circuits for receiving/transmitting signalsfrom/to the physical layer of the first semiconductor device 210. Thesecond semiconductor device 220 may provide various signals to thephysical layer of the first semiconductor device 210 through thephysical layer of the second semiconductor device 220. For example, thememory controller may control all operations of the first semiconductordevice 210. The memory controller may transmit signals for controllingthe first semiconductor device 210 to the First semiconductor device 210through the metal interconnect pattern 121 of the interposer 100.

The semiconductor package 1000 may further include a package moldinglayer 310 disposed on the interposer 100 which molds the firstsemiconductor device 210 and the second semiconductor device 220. In anexemplary embodiment, the package molding layer 310 may include, forexample, an EMC. As shown in the exemplary embodiment of FIG. 11 , thepackage molding layer 310 may cover the upper surface of the interposer100, the lateral side surface of the first semiconductor device 210, andthe lateral side surface of the second semiconductor device 220, but maynot cover upper surfaces of the first and second semiconductor devices210 and 220.

The semiconductor package 1000 may further include a heat dissipationmember 530 that is disposed on an upper surface of the package substrate510 and covers the upper surfaces of the first and second semiconductordevices 210 and 220. The heat dissipation member 530 may include a heatdissipation plate such as a heat slug or a heat sink. In an exemplaryembodiment, the heat dissipation member 530 may surround, on the uppersurface of the package substrate 510, the first semiconductor device210, the second semiconductor device 220, and the interposer 100.

Also, the semiconductor package 1000 may further include a thermalinterface material (TIM) 540. The TIMs 540 may be disposed between anupper surface of the heat dissipation member 530 and the firstsemiconductor device 210 (e.g., in a thickness direction of the packagesubstrate 510) and between an upper surface of the heat dissipationmember 530 and the second semiconductor device 220 (e.g., in a thicknessdirection of the package substrate 510).

The package substrate 510 may be electrically connected to theinterposer 100 through the board-interposer connection terminal 183. Anunderfill material layer 520 may be disposed between the interposer 100and the package substrate 510. The underfill material layer 520 maysurround the board-interposer connection terminals 183.

The package substrate 510 may include a substrate base 511, andsubstrate upper and lower pads 513 and 515 which are disposed on upperand lower surfaces of the substrate base 511, respectively. In anexemplary embodiment, the package substrate 510 may be a printed circuitboard (PCB). For example, the package substrate 510 may be a multi-layerPCB. In an exemplary embodiment, the substrate base 511 may include atleast one of phenol resin, epoxy resin, and polyimide. The substratetipper pad 513 may be connected to the board-interposer connectionterminal 183, and the substrate lower pad 515 may be connected to thepackage connection terminal 560 that electrically connects an externalterminal to the semiconductor package 1000.

According to an exemplary embodiment of the present inventive concepts,the warpage of the interposer 100 may be controlled by adjusting (i) aratio of the total volume of the lower conductive pads 153 to the totalvolume of the metal interconnect pattern 121 and/or (ii) the compressivestress and the thicknesses of the insulating layer 125 and the firstlower protection layer 145. For example, in all predeterminedtemperature sections, the ratio of the total volume of the metalinterconnect pattern 121 to the total volume of the lower conductivepads 153 may be adjusted, and the compressive stress applied to theinsulating layer 125 and the first lower protection layer 145 may beadjusted so that the warpage of the interposer 100 is within apredetermined range. For example, the predetermined range of the warpageof the interposer 100 may be in a range of about −70 μm to about +70 μm.Since the warpage of the interposer 100 is controllable to be within apredetermined range, the semiconductor package 1000 including theinterposer 100 may have an increased reliability,

FIGS. 12A to 12H are cross-sectional views of a manufacturing method ofthe interposer 100 according to exemplary embodiments of the presentinventive concepts. Referring to FIGS. 12A to 1214 , examples of amanufacturing method of the interposer 100 of FIGS. 5 to 7 will bedescribed.

Referring to the exemplary embodiment of FIG. 12A, the through electrode130 is formed in the base layer 110 of the interposer 100. For example,in an exemplary embodiment, the base layer 110 may be a silicon wafer.The through electrode 130 may extend from the first surface 111 of thebase layer 110 to a second surface 113′ thereof, but may not penetratethe base layer 110. For example, a bottom portion of the throughelectrode 130 may be spaced apart from the second surface 113 and thethrough electrode 130 may not extend through the second surface 113′.

In an exemplary embodiment, after the through electrode 130 is formed, aredistribution process may be performed to form the interconnectstructure 120 on the first surface 111 of the base layer 110. Theinterconnect structure 120 may include the metal interconnect pattern121 and the insulating layer 125 surrounding the metal interconnectpattern 121. The metal interconnect pattern 121 may include theconductive line patterns 1211, which are spaced apart from each other ina vertical direction to form a multilayered structure, for example, astructure of four layers, and the conductive vias 1213 extending in thevertical direction to connect the conductive line patterns 1211.

In an exemplary embodiment, a PECVD process may be performed to form theinsulating layer 125. As the PECVD process is performed, the compressivestress applied to the insulating layer 125 may be adjusted bycontrolling process conditions such as a temperature and pressure. In anexemplary embodiment, the insulating layer 125 may include siliconoxide.

Referring to the exemplary embodiment of FIG. 12B, after theinterconnect structure 120 is formed, the upper conductive pad 173 isformed on the interconnect structure 120. For example, in an exemplaryembodiment, the upper conductive pad 173 may be formed by timing aconductive layer on the interconnect structure 120. The conductive layermay then be patterned to form the upper conductive pad 173. In anexemplary embodiment, the upper conductive pad 173 may include Al, Ni,Cu, or a combination thereof.

After the upper conductive pad 173 is formed, an upper protection layer171 may then be formed on the interconnect structure 120. The upperconductive layer 171 may cover an upper surface of the interconnectstructure 120 and a partial portion of the upper conductive pad 173,such as sidewalls and lateral ends of the upper surface of the upperconductive pad 173. The upper protection layer 171 may have an openingthrough which the upper surface of the upper conductive pad 173 ispartially exposed. For example, the opening may be in a central portionof the upper surface of the upper conductive pad 173.

In an exemplary embodiment, the PECVD process may be performed to formthe upper protection layer 171. As the PECVD process is performed, thecompressive stress applied to the upper protection layer 171 may beadjusted by controlling the process conditions such as a temperature andpressure. In an exemplary embodiment, the upper protection layer 171 mayinclude silicon oxide, silicon nitride, or a combination thereof.

After the upper protection layer 171 is formed, an upper connectionpillar 175 may be formed on the upper protection layer and the upperconductive pad 173. The upper connection pillar 175 is electricallyconnected to the upper conductive pad 173 exposed through the opening ofthe upper protection layer 171. For example, in an exemplary embodiment,the upper connection pillar 175 may be formed by forming a seed metallayer on the upper conductive pad 173 and the upper protection layer171. A mask pattern which exposes a portion of the upper connectionpillar 175 may then be formed and a conductive material layer, which isformed through a plating process in which the seed metal layer is usedas a seed, may be formed, thereby removing the mask pattern and aportion of the seed metal layer that is disposed under the mask pattern.

Referring to the exemplary embodiment of FIG. 12C, the product shown inthe exemplary embodiment of FIG. 12B may be attached to a carriersubstrate CS. The product of the exemplary embodiment of FIG. 12B may beattached to the carrier substrate CS to enable the first surface 111 ofthe base layer 110 to face the carrier substrate CS. In an exemplaryembodiment, the carrier substrate CS may be, for example, asemiconductor substrate, a glass substrate, a ceramic substrate, or aplastic substrate.

Referring to the exemplary embodiment of FIG. 12D, a portion of the baselayer 110 may be removed to expose the through electrode 130. Forexample, an upper portion of the base layer 110 may be removed to exposean upper surface of the through electrode 130. As a portion of the baselayer 110 is removed, the through electrode 130 may be exposed throughthe second surface 113 of the base layer 110 and may penetrate the baselayer 110.

The through electrode 130 may protrude from the second surface 113 ofthe base layer 110. For example, a planarization process, such as a CMPprocess, may be performed on the product of the exemplary embodiment ofFIG. 12C to remove a portion of the base layer 110 until the throughelectrode 130 is exposed. The CMP process may be further performed toremove upper portions of the base layer 110 to expose sidewalls of thethrough electrode 130.

Referring to the exemplary embodiment of FIG. 12E, a first preliminarylower protection layer 146 is formed on the exposed portions of thethrough electrode 130 and the upper portion of the base layer 110. Forexample, the first preliminary lower protection layer 146 may cover thesecond surface 113 of the base layer 110 and the portion of the throughelectrode 130 protruding from the second surface 113 of the base layer110.

In an exemplary embodiment, the PECVD process may be performed to formthe first preliminary lower protection layer 146. While the PECVDprocess is performed, the compressive stress applied to the firstpreliminary lower protection layer 146 may be adjusted by controllingprocess conditions such as temperature and pressure. In an exemplaryembodiment, the first preliminary lower protection layer 146 may includesilicon oxide, silicon nitride, or a combination thereof.

For example, the PECVD process may be performed to form the firstpreliminary lower protection layer 146. While the PECVD process isperformed, the compressive stress applied to the first preliminary lowerprotection layer 146 may be adjusted by controlling the processconditions such as a temperature and pressure. In an exemplaryembodiment, the first preliminary lower protection layer 146 may includesilicon oxide, silicon nitride, or a combination thereof. In anexemplary embodiment, the first preliminary lower protection layer 146may include a first layer 1451 and a second layer 1452 which are stackedon each other. The first layer 1451 may include silicon oxide, and thesecond layer 1452 may include silicon nitride.

In an exemplary embodiment, the PECVD process for forming the firstpreliminary lower protection layer 146 may be performed at a lowertemperature than the PECVD process for forming the insulating layer 125.For example, when the PECVD process for forming the insulating layer 125is performed at a temperature of about 400° C., the PECVD process forforming the first preliminary lower protection layer 146 may beperformed at a temperature of about 180° C. In this exemplaryembodiment, the first preliminary lower protection layer 146 may havecompressive stress that is less than the compressive stress of theinsulating layer 125. Since the PECVD process for forming the firstpreliminary lower protection layer 146 is performed at a relatively lowtemperature, the deterioration of an adhesion material layer CM may beprevented.

In general, when a process requiring a high temperature is performedwhile a wafer is fixed on the carrier substrate CS by using the adhesionmaterial layer CM, there is a risk (e.g., an unfill risk) that theadhesion material layer CM is not filled between the carrier substrateCS and an edge portion of the wafer due to the warpage of the wafer.However, according to an exemplary embodiment of the present inventiveconcepts, the unfill risk may be reduced during the manufacture of theinterposer by controlling warpage of an intermediate structure of theinterposer attached to the carrier substrate CS by using the insulatinglayer 125 to which the compressive stress is applied.

Referring to the exemplary embodiments of FIGS. 12E and 2F, a partialportion of the first preliminary lower protection layer 146 may beremoved to expose the through electrode 130. For example, an upperportion of the first preliminary lower protection layer 146 may beremoved to expose the through electrode 130. After the partial portionof the first preliminary lower protection layer 146 is removed, thefirst lower protection layer 145, which covers the second surface 113 ofthe base layer 110 and the sidewall of the through electrode 130protruding from the second surface 113 of the base layer 110, may beformed.

For example, to expose the through electrode 130, a polishing processsuch as a CMP process may be performed. As a result of the polishingprocess, a surface of the exposed through electrode 130 may be on thesame plane as an upper surface of the first lower protection layer 145.

Referring to the exemplary embodiment of FIG. 12G, the lower conductivepad 153, which is electrically connected to the through electrode 130 isformed on the first lower protection layer 145 and an upper surface ofthe through electrode 130. For example in an exemplary embodiment, aconductive layer may be formed on the first lower protection layer 145,and a patterning process tray then be performed on the conductive layerto form the lower conductive pad 153.

After the lower conductive pad 153 is formed, the second lowerprotection layer 160 is formed on the first lower protection layer 145and the lower conductive pad 153. The second lower protection layer 160may cover the first lower protection layer 145 and a partial portion ofthe lower conductive pad 153. For example, the second lower protectionlayer 160 may cover lateral end portions of the upper surface of thelower conductive pad 153. The second lower protection layer 160 may havean opening through which the lower conductive pad 153 is partiallyexposed. For example, the opening, of the second lower protection layer160 may overlap a central portion of the lower conductive pad 153. In anexemplary embodiment, the second lower protection layer 160 may includean organic material. For example, the second lower protection layer 160may include PID such as polyimide.

Referring to the exemplary embodiments of FIGS. 12G and 12H, the lowerconnection pillar 181 may be formed an the portion of the lowerconductive pad 153 exposed through the opening of the second lowerprotection layer 160 and the second lower protection layer 160. Theboard-interposer connection terminal 183 may be formed on the lowerconnection pillar 181. In an exemplary embodiment, the board-interposerconnection terminal 183 may be formed as a solder ball or a solder bump.The interposer 100 of the exemplary embodiments of FIGS. 5 to 7 may thenbe formed by removing the adhesion material layer CM and the carriersubstrate CS.

FIGS. 13A and 13B are cross-sectional views of a manufacturing method ofa semiconductor package, according to exemplary embodiments of thepresent inventive concepts.

Referring to the exemplary embodiment of FIG. 13A, the firstsemiconductor device 210 and the second semiconductor device 220 aremounted on the interposer 100. In an exemplary embodiment, the firstsemiconductor device 210 and the second semiconductor device 220 may besemiconductor dies that are diced respectively and individualized, ormay each be a sub-packet into which at least one semiconductor die ismolded. For example, the first semiconductor device 210 may beelectrically connected to the metal interconnect pattern 121 of theinterposer 100 through the first chip connection terminal 231 attachedto the upper connection pillar 175, and the second semiconductor device220 may be electrically connected to the metal interconnect pattern 121of the interposer 100 through the second chip connection terminal 223attached to the upper connection pillar 175. In an exemplary embodiment,the first chip connection terminal 231 and the second chip connectionterminal 223 may each be a solder ball or a solder hump.

Referring to the exemplary embodiment of FIG. 13B, after the firstsemiconductor device 210 and the second semiconductor device 220 aremounted on the interposer 100, an underfill process may be performed inwhich the first underfill material layer 311, which fills a gap betweenthe first semiconductor device 210 and the interposer 100, and thesecond underfill material layer 313, which fills a gap between thesecond semiconductor device 220 and the interposer 100 are formed. Thepackage molding layer 310 which covers the side surfaces of the firstand second semiconductor devices 210 and 220, are then formed on theinterposer 100. The package molding layer 310 may include, for example,an EPC.

After the package molding layer 310 is formed, the TIM 540 may be formedon the upper surface of the first semiconductor device 210, the uppersurface of the second semiconductor device 220, and the upper surface ofthe package molding layer 310.

As illustrated in the exemplary embodiment of FIG. 11 , the interposer100 is mounted on the package substrate 510. The interposer 100 may bemounted on the package substrate 510 through the board-interposerconnection terminal 183. The underfill material layer 520, whichsurrounds the board-interposer connection terminal 183, may be formedbetween the interposer 100 and the package substrate 510. The heatdissipation member 530, which surrounds the first semiconductor device210, the second semiconductor device 220, and the interposer 100, maythen be attached to the upper surface of the package substrate 510 andthe heat dissipation member 530.

In manufacturing processes of a semiconductor package using a generalinterposer, a relatively large warpage is generated during a process,for example, a reflow process, which requires a high temperature. Due tosuch warpage, the adhesion reliability between the interposer and thesemiconductor devices degrades. However, according to an exemplaryembodiment of the present inventive concepts, the warpage of theinterposer 100 may be adjusted to be in an appropriate range byadjusting (i) a ratio of the total volume of the lower conductive pads153 to the total volume of the metal interconnect pattern 121 and/or(ii) the compressive stress applied to the insulating layer 125 and thefirst lower protection layer 145 and the thicknesses thereof. Therefore,the reliability of the semiconductor package of the interposer 100 maybe increased.

While the present inventive concepts have been particularly illustratedand described with reference to exemplary embodiments thereof it will beunderstood that various changes in form and details may be made thereinwithout departing from be spirit and scope of the following claims.

What is claimed is:
 1. An interposer comprising: a base layer includinga first surface and a second surface that are opposite to each other; aninterconnect structure disposed on the first surface of the base layer,the interconnect structure including a metal interconnect pattern and aninsulating layer surrounding the metal interconnect pattern; a firstlower protection layer disposed on the second surface of the base layer;a plurality of lower conductive pads disposed on the first lowerprotection layer; a second lower protection layer disposed directly onthe first lower protection layer and the plurality of lower conductivepads, the second lower protection layer includes an organic material;and a plurality of through electrodes that penetrate the base layer andthe first lower protection layer, the plurality of through electrodes isconfigured to electrically connect the metal interconnect pattern of theinterconnect structure to the plurality of lower conductive pads,wherein at least one of the insulating layer and the first lowerprotection layer has compressive stress, and wherein a thickness of thefirst lower protection layer is in a range of about 13% to about 30% ofa thickness of the insulating layer.
 2. The interposer of claim 1,wherein: the insulating layer and the first lower protection layer bothhave the compressive stress; and the compressive stress of theinsulating layer is greater than the compressive stress of the firstlower protection layer.
 3. The interposer of claim 1, wherein a totalvolume of the plurality of lower conductive pads is in a range of about70% to about 100% of a total volume of the metal interconnect pattern.4. The interposer of claim 1, further comprising: the second lowerprotection layer contacting side surfaces of the plurality of lowerconductive pads and the first lower protection layer and having anopening defined in the second lower protection layer; and a plurality ofconnection terminals connected to the plurality of lower conductive padsthrough the opening of the second lower protection layer.
 5. Theinterposer of claim 4, wherein: the insulating layer and the first lowerprotection layer include inorganic materials.
 6. The interposer of claim4, wherein: the first lower protection layer contacts portions ofsidewalls of the plurality of through electrodes that protrude from thesecond surface of the base layer; and lower surfaces of the plurality ofthrough electrodes are positioned at a same level as a lower surface ofthe first lower protection layer.
 7. The interposer of claim 4, wherein:the plurality of lower conductive pads comprise upper surfaces thatcontact the first lower protection layer and lower surfaces that contactthe plurality of connection terminals; and the upper and lower surfacesof the plurality of lower conductive pads are substantially planar. 8.The interposer of claim 1, wherein: the first lower protection layercomprises a first layer and a second layer that are sequentially stackedon the second surface of the base layer, wherein the first layercomprises silicon oxide and the second layer comprises silicon nitride.9. The interposer of claim 1, wherein each of the plurality of lowerconductive pads is connected to at least two through electrodes of theplurality of through electrodes.
 10. The interposer of claim 1, furthercomprising a conductive dummy pattern disposed on the first lowerprotection layer, the conductive dummy pattern is separated from theplurality of lower conductive pads and the plurality of throughelectrodes.
 11. The interposer of claim 1, wherein: the insulating layerand the first lower protection layer both have the compressive stress;the compressive stress of the insulating layer is in a range of about150 MPa to about 250 MPa; and the compressive stress of the first lowerprotection layer is in a range of about 100 MPa to about 200 MPa.